Tech Xplore on MSN
New semiconductor etching process achieves five-fold speed improvement
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor ...
In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Discover Tokyo Electron’s new semiconductor etching method for faster, greener, and precise chip production. Read more ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
On Wednesday, U.S. chip equipment maker Lam Research Corp (NASDAQ:LRCX) launched two new tools for building advanced artificial intelligence chips. The company introduced Akara, an innovative plasma ...
Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...
Plasma resistant coatings are advanced protective layers engineered to withstand the aggressive conditions encountered in plasma processing, especially within semiconductor manufacturing. These ...
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