Abstract: In the advanced-tech node's shallow trench insulation (STI) chemical mechanical planarization (CMP) process development, by doing design of experiments (DOEs) and repeat runs, the scratch ...
Unfolding like 100 years of home video footage that were shot by the family ghosts, Mascha Schilinski’s rich and mesmeric “ ...
This is the open source version of Scratch 2.0 and the core code for the official version found on http://scratch.mit.edu. This code has been released under the GPL ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback